Geometrical Correction Factor for Resistivity of Semiconductors by the Square Four-Point Probe Method
- 1 April 1986
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 25 (4R)
- https://doi.org/10.1143/jjap.25.563
Abstract
The geometrical correction factor for the resistivity of semiconductors is derived for a system consisting of a square four-point probe array on a rectangular parallelepied. The van der Pauw method requires the geometrical correction factor for samples with a thickness greater than about 35% of the probe separation. Numerical evaluations are given as a function of the size of the rectangular parallelepiped and the probe configuration.Keywords
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