Stress relaxation in tantalum silicide films by particle bombardment
- 1 August 1989
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 175, 61-65
- https://doi.org/10.1016/0040-6090(89)90809-2
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- I n s i t u stress measurement of refractory metal silicides during sinteringJournal of Applied Physics, 1984
- A Monte Carlo computer program for the transport of energetic ions in amorphous targetsNuclear Instruments and Methods, 1980