Single-Target Sputtring Process for Lead Zirconate Titanate Thin Films with Precise Composition Control
- 1 December 1991
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 30 (12S)
- https://doi.org/10.1143/jjap.30.3562
Abstract
The influence of growth conditions on rf-magnetron sputtered lead zirconate titanate (or PZT) thin films has been investigated, and the structural and electrical properties of PZT thin films have been examined. It was found that the Pb content in a sputtered film is proportional to rf power, thereby making it possible to control the film composition precisely. A well-crystallized perovskite structure was obtained by postdeposition annealing at 590°C. A stoichiometric film (i.e., Pb/Zr+Ti=1) had a dielectric constant value of 1180.Keywords
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