Thermal Stability of Ni-C Multilayer Mirror for X-Rays
- 1 September 1992
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 31 (9R) , 2864-2868
- https://doi.org/10.1143/jjap.31.2864
Abstract
The measurement of X-ray reflectivity has been performed with the lapse of annealing time for heat treatment up to 400°C in order to investigate the thermal stability of a nickel-carbon multilayer mirror for X-rays. The microstructural change of a multilayer film has been examined by means of X-ray diffraction, Auger electron spectroscopy and electron microscopy. The results show that the crystallization of nickel and the formation of nickel carbide occur for annealing above 300°C. As a consequence of microstructural changes, the surface and interfaces become rough, layer structure is destroyed, and the X-ray reflectivity shows a definite decrease.Keywords
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