Effect of Hydrogen Plasma Treatment on Implantation Damage in Diamond Films Grown by Chemical Vapour Deposition
- 1 August 1992
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 31 (8B) , L1191
- https://doi.org/10.1143/jjap.31.l1191
Abstract
Radiation damage in chemical vapour deposited (CVD) diamond produced by the implantation of 10-keV nitrogen ions has been studied using electron energy loss spectroscopy (EELS) and cathodoluminescence. Thermal annealing and a hydrogen plasma treatment have been employed to anneal out the implantation damage. Graphitization of ion implanted CVD diamond was observed after subsequent thermal annealing. On the other hand, similar EELS spectra to that of as-grown diamond have been obtained from ion-implanted CVD diamond after hydrogen plasma treatment.Keywords
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