Preparation of titanium-oxide films by solid-state reactions of titanium/silicon-oxide/silicon structures
- 1 December 1998
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 334 (1-2) , 109-112
- https://doi.org/10.1016/s0040-6090(98)01126-2
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- Thin TiO2 Films Prepared by Low Pressure Chemical Vapor DepositionJournal of the Electrochemical Society, 1993
- TiO2 / SiO2 Multilayer Insulating Films for ELDsJournal of the Electrochemical Society, 1992
- Electronic Properties of the Interface between Si and TiO2 Deposited at Very Low TemperaturesJapanese Journal of Applied Physics, 1986
- Electron microscopy of multilayer thin filmsThin Solid Films, 1970
- Thermodynamics of SolidsJournal of the Electrochemical Society, 1962