Reflectance study of the oscillator strength of excitons in semiconductor quantum wells

Abstract
The oscillator strength of excitons is investigated systematically in lattice-matched GaAs/Alx Ga1xAs, strained-well Inx Ga1xAs/GaAs, and strained-well GaAs/GaAs1x Px quantum wells (QW’s) using Fourier-transform reflectance spectroscopy. The oscillator strength in GaAs/Alx Ga1xAs QW’s increases as the well width is reduced, in agreement with the existing theory, while those in Inx Ga1xAs/GaAs and GaAs/GaAs1x Px QW’s show a maximum at a certain well width. The well-width dependence of the band nonparabolicity and the overlap of the electron and hole wave functions is responsible for this behavior. The oscillator strengths in Inx Ga1xAs/GaAs and GaAs/GaAs1x Px QW’s are differently dependent on the alloy composition; this is also explained in terms of the band nonparabolicity and the wave-function overlap. The temperature dependence of the oscillator strength in these structures is well described by a modified Debye-Waller expression with an averaged phonon mode. The exciton-phonon interaction, deduced from the temperature dependence of the oscillator strength of the zero-phonon line, is mainly determined by confined phonons in GaAs/Alx Ga1xAs QW’s, and by quasi-three-dimensional phonons in Inx Ga1xAs/GaAs QW’s.