Surface chemical phenomena influencing the growth of thin films
- 1 August 1980
- journal article
- Published by Springer Nature in Acta Physica Academiae Scientiarum Hungaricae
- Vol. 49 (1) , 77-85
- https://doi.org/10.1007/bf03158715
Abstract
No abstract availableKeywords
This publication has 19 references indexed in Scilit:
- The electrical and compositional structure of thin Ni-Cr filmsThin Solid Films, 1979
- Untersuchung der Volumenstruktur dünner Bi1–xSbx‐SchichtenCrystal Research and Technology, 1977
- Effect of impurities on intrinsic stress in thin Ni filmsJournal of Vacuum Science and Technology, 1976
- The chemisorption of oxygen, water and selected hydrocarbons on the (111) and stepped gold surfacesSurface Science, 1975
- Auger examination of contaminants in thin−film metallizationsJournal of Applied Physics, 1975
- Oxide structure in evaporated aluminum filmsJournal of Applied Physics, 1974
- In SituElectron Microscopy of Thin Film GrowthJapanese Journal of Applied Physics, 1974
- Selected area and in-depth auger analysis of thin filmsThin Solid Films, 1973
- Impurity effects on the structure of amorphous silicon and germanium prepared in various waysPhilosophical Magazine, 1973
- Diffusion measurements in thin films utilizing work function changes: Cr into AuJournal of Applied Physics, 1972