Lithography of high spatial density biosensor structures with sub-100 nm spacing by MeV proton beam writing with minimal proximity effect
- 26 November 2003
- journal article
- research article
- Published by IOP Publishing in Nanotechnology
- Vol. 15 (1) , 223-226
- https://doi.org/10.1088/0957-4484/15/1/040
Abstract
Metal electrode structures for biosensors with a high spatial density and similar to85 nm gaps have been produced using focused megaelectronvolt (MeV) proton beam writing of poly-(methyl methacrylate) positive resist combined with metal lift-off. The minimal proximity exposure and straight proton trajectories in (similar to100 nm) resist layers for focused MeV proton beam writing are strongly indicative that ultimate electrode gap widths approaching a few nanometres are achievable.This publication has 24 references indexed in Scilit:
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