Suspended membrane inductors and capacitors for application in silicon MMIC's
- 23 December 2002
- conference paper
- Published by Institute of Electrical and Electronics Engineers (IEEE)
Abstract
This paper considers the fabrication and modelling of suspended membrane inductors and capacitors on ordinary silicon substrates. A single post-processing etching step was added to an otherwise standard process. For both components, parasitic capacitances to ground are drastically reduced, enabling high frequency operation. Furthermore, the measured quality factor Q is demonstrably improved with respect to normally fabricated thin film components.Keywords
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