The structural stability of reactively-sputtered amorphous multilayer films
- 1 December 1987
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 97-98, 947-950
- https://doi.org/10.1016/0022-3093(87)90228-6
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Interdiffusion in Si/Ge amorphous multilayer filmsApplied Physics Letters, 1985
- Energy Transport and Size Effects in the Photoluminescence of Amorphous-Germanium/Amorphous-Silicon Multilayer StructuresPhysical Review Letters, 1985
- Bandgap and resistivity of amorphous semiconductor superlatticesJournal of Non-Crystalline Solids, 1984
- Amorphous Semiconductor SuperlatticesPhysical Review Letters, 1983