Analysis of the depth profile of Fe-Si buried layers in Fe+-implanted Si wafer by soft X-ray emission spectroscopy
- 1 September 1993
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 72 (1) , 73-77
- https://doi.org/10.1016/0169-4332(93)90045-d
Abstract
No abstract availableKeywords
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