Chemical vapour deposition of boron carbides on uncoated and TiC-coated cemented carbide substrates
- 15 November 1990
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 42 (2) , 187-201
- https://doi.org/10.1016/0257-8972(90)90124-u
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- Solid particle erosion of hard chemically vapour- deposited coatingsSurface and Coatings Technology, 1989
- Chemical vapour deposition of boron carbides II: Morphology and microstructureThin Solid Films, 1989
- Chemical vapour deposition of boron carbides I: Phase and chemical compositionThin Solid Films, 1989
- Contribution to the theory of charge exchange at surfacesJournal de Physique, 1989
- Area selective chemical vapor deposition of boron carbide achieved by molecular maskingJournal of Vacuum Science & Technology A, 1988
- Initial stages of growth during boron carbide chemical vapor depositionJournal of Vacuum Science & Technology A, 1987
- Theoretical and experimental studies on the chemical vapor deposition of boron carbideIndustrial & Engineering Chemistry Product Research and Development, 1985
- Comparison of wear behaviour of single- and multilayer coated carbide cutting toolsMetals Technology, 1980
- The thermodynamic approach to boron chemical vapour deposition based on a computer minimization of the total gibbs free energyJournal of the Less Common Metals, 1979
- Das B-C-system im kinetischen bildungsbereich: Pyrolytische bildung kohlenstoffreicher B-C-PhasenJournal of the Less Common Metals, 1971