Dynamic conductance of Ni80Fe20/AlOx/Ni80Fe20 tunnel junctions
- 1 May 2000
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 87 (9) , 5203-5205
- https://doi.org/10.1063/1.373295
Abstract
The shape of the dynamic conductance versus voltage of NiFe/AlO x / NiFe tunnel junctions is correlated with the intensity and duration of oxidation. A shift of the conductance minimum towards positive voltage (up to 100 mV) indicates that the Al layer is only partially oxidized. In contrast, a shift of the conductance minimum towards negative voltage indicates oxidation of the bottom electrode and/or damage to the top surface of the barrier. Annealing of the junctions makes the tunnel barrier effectively thinner and taller, as implied by a fit to the parabolic conductance. These qualitative trends are observed for Al layers ranging from 10 to 35 Å in thickness. In conjunction with these effects, we observe the highest magnetoresistance (up to 26.6%) and the best bias dependence of the magnetoresistance when the conductance is symmetric.This publication has 6 references indexed in Scilit:
- Low resistance spin-dependent tunnel junctions deposited with a vacuum break and radio frequency plasma oxidizedApplied Physics Letters, 1999
- Tunneling magnetoresistance and current distribution effect in spin-dependent tunnel junctionsJournal of Applied Physics, 1998
- Large Magnetoresistance at Room Temperature in Ferromagnetic Thin Film Tunnel JunctionsPhysical Review Letters, 1995
- Origin of the linear tunneling conductance backgroundPhysical Review B, 1992
- Tunneling Conductance of Asymmetrical BarriersJournal of Applied Physics, 1970
- Single- and Double-Deformation Faults in Face-Centered Cubic CrystalsJournal of Applied Physics, 1963