Novel effects of magnetic field on the silane glow discharge
- 1 November 1980
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 37 (9) , 787-788
- https://doi.org/10.1063/1.92074
Abstract
We have measured the optical‐emission spectra of the silane plasma as a function of the external magnetic field, together with the growth rate and vibrational spectra of the resulting a‐Si:H films. The optical‐emission intensities of the reactive species SiH, H2, and H produced in the plasma are appreciably affected by the magnetic field, and the corresponding change in the hydrogen bonding of the deposited films is interpreted in terms of chemical reaction among the species.Keywords
This publication has 3 references indexed in Scilit:
- Modifications in optoelectronic behavior of plasma-deposited amorphous semiconductor alloys via impurity incorporationJournal of Non-Crystalline Solids, 1980
- Plasma spectroscopy control and analysis of a-Si:H depositionJournal of Non-Crystalline Solids, 1980
- THE SPECTRUM OF SILICON HYDRIDECanadian Journal of Physics, 1957