Optimization and Structural Characterization of W/Al2O3 Nanolaminates Grown Using Atomic Layer Deposition Techniques
- 28 May 2005
- journal article
- research article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 17 (13) , 3475-3485
- https://doi.org/10.1021/cm050470y
Abstract
No abstract availableThis publication has 53 references indexed in Scilit:
- Ultra-Low Thermal Conductivity in W/Al 2 O 3 NanolaminatesScience, 2004
- Microstructural evolution of ZrO2–HfO2 nanolaminate structures grown by atomic layer depositionJournal of Materials Research, 2004
- Rapid Vapor Deposition of Highly Conformal Silica NanolaminatesScience, 2002
- Characterisation of ALCVD Al2O3–ZrO2 nanolaminates, link between electrical and structural propertiesJournal of Non-Crystalline Solids, 2002
- X-ray Reflectivity Characterization of ZnO/Al2O3 Multilayers Prepared by Atomic Layer DepositionChemistry of Materials, 2002
- Thermal properties of perfluorinated n-alkanoic acids self-assembled on native aluminum oxide surfacesJournal of Vacuum Science & Technology A, 1998
- Metal/Al2O3: A new class of x-ray mirrorsJournal of Applied Physics, 1996
- Thermal conductivity of sputtered oxide filmsPhysical Review B, 1995
- Layer-by-layer design method for soft-x-ray multilayersApplied Optics, 1992
- Verwendung von Schwingquarzen zur W gung d nner Schichten und zur Mikrow gungThe European Physical Journal A, 1959