Self-assembled monolayers exposed by metastable argon and metastable helium for neutral atom lithography and atomic beam imaging
- 1 September 1997
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 15 (5) , 1805-1810
- https://doi.org/10.1116/1.589529
Abstract
No abstract availableKeywords
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