The g-Values of Defects in Amorphous C, Si and Ge
- 1 September 1981
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 20 (9) , L673
- https://doi.org/10.1143/jjap.20.l673
Abstract
The g-values of the ESR signal have been calculated for dangling bonds in amorphous C, Si and Ge and for weak bonds in amorphous Si by using the EHT method. Effects on g-values of changing the bond angle, bond length and dihedral angle have been calculated and found that the change of g-values due to fluctuations of the amorphous structure is dominated by the change of the bond angle. Although the calculated g-values depend on the cluster size, the results are useful for qualitative considerations on the dangling bonds and the weak bonds.Keywords
This publication has 7 references indexed in Scilit:
- ESR studies on sputtered amorphous SiC, SiGe and GeC filmsSolid State Communications, 1981
- E.S.R. in doped CVD amorphous silicon filmsPhilosophical Magazine Part B, 1981
- Fundamental Physics of Amorphous SemiconductorsPublished by Springer Nature ,1981
- Application of molecular orbital method to crystalline solids: Calculation of the electronic energy bands of diamond-type crystalsThe Journal of Chemical Physics, 1978
- Electron Spin Resonance in Amorphous Silicon, Germanium, and Silicon CarbidePhysical Review Letters, 1969
- Atomic Screening Constants from SCF FunctionsThe Journal of Chemical Physics, 1963
- Gauge invariance of the g tensorProceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, 1963