Dependence of Electron Cyclotron Resonance Plasma Characteristics on Magnetic Field Profiles
- 1 November 1991
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 30 (11S) , 3147
- https://doi.org/10.1143/jjap.30.3147
Abstract
Electron cyclotron resonance (ECR) plasma generation is influenced by the magnetic field profiles in ECR plasma. When an 875 G equimagnetic field and magnetic field gradient are nonuniform, the nonuniform plasma is generated around the ECR position (875 G position). Uneven plasma discharge causes ion acceleration and disturbs the ion flight directions due to the potential differences in ECR plasma. Therefore, a uniform magnetic field gradient at the ECR position and the flat 875 G equimagnetic field profile are necessary to achieve a precise pattern transfer without microloading effects.Keywords
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