Resistivity of chemically deposited polycrystalline-silicon films
- 31 March 1972
- journal article
- research article
- Published by Elsevier in Solid-State Electronics
- Vol. 15 (3) , 355-358
- https://doi.org/10.1016/0038-1101(72)90090-1
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
- A new technology for high-power ICIEEE Transactions on Electron Devices, 1971
- Silicon gate technologySolid-State Electronics, 1970
- Electronic Transport in Amorphous Silicon FilmsPhysical Review Letters, 1970
- Structural, Optical, and Electrical Properties of Amorphous Silicon FilmsPhysical Review B, 1970
- Structure of Silicon Films Deposited on Oxidized Silicon WafersJournal of the Electrochemical Society, 1970
- Thermal and Electrical Anisotropy of Polycrystalline SiliconJournal of Applied Physics, 1969