XPS, XANES and ToF-SIMS Characterization of Reactively Magnetron-sputtered Carbon Nitride Films
- 1 September 1997
- journal article
- research article
- Published by Wiley in Surface and Interface Analysis
- Vol. 25 (10) , 827-835
- https://doi.org/10.1002/(sici)1096-9918(199709)25:10<827::aid-sia331>3.0.co;2-w
Abstract
No abstract availableKeywords
This publication has 27 references indexed in Scilit:
- Formation of the crystalline β-C3N4 phase by dual ion beam sputtering depositionMaterials Letters, 1995
- Carbon Nitride Deposited Using Energetic Species: A Two-Phase SystemPhysical Review Letters, 1994
- Irradiation effects induced by reactive and non‐reactive low energy ion irradiation of graphite: An electron spectroscopy studySurface and Interface Analysis, 1994
- In situ ToF‐SIMS/XPS investigation of nitrogen plasma‐modified polystyrene surfacesSurface and Interface Analysis, 1994
- Photoelectron-spectroscopy study of amorphousa-:HPhysical Review B, 1993
- Structure and bonding studies of the C:N thin films produced by rf sputtering methodJournal of Materials Research, 1990
- Structural analysis of hydrogenated diamond-like carbon films from electron energy loss spectroscopyJournal of Materials Research, 1990
- Structural properties and electronic structure of low-compressibility materials: β- and hypothetical β-Physical Review B, 1990
- Characterization of metal/organic molecule and metal/polymer interfaces by NEXAFS spectroscopyFaraday Discussions of the Chemical Society, 1990
- X-ray photoemission studies of diamond, graphite, and glassy carbon valence bandsPhysical Review B, 1974