Formation mechanism for TiOx thin film obtained by remote plasma enhanced chemical vapor deposition in H2–O2 mixture gas plasma
- 5 December 2001
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 401 (1-2) , 138-144
- https://doi.org/10.1016/s0040-6090(01)01637-6
Abstract
No abstract availableKeywords
This publication has 17 references indexed in Scilit:
- Comparison of hydrophilic properties of amorphous TiOx films obtained by radio frequency sputtering and plasma-enhanced chemical vapor depositionJournal of Materials Research, 2001
- Hydrophilic characteristics of rf-sputtered amorphous TiO2 filmVacuum, 2000
- XRD, Raman and FT-IR spectroscopic observations of nanosized TiO2 synthesized by the sol–gel method based on an esterification reactionJournal of Molecular Structure, 1999
- Studies of Surface Wettability Conversion on TiO2 Single-Crystal SurfacesThe Journal of Physical Chemistry B, 1999
- Time-Dependent Behavior of Active Oxygen Species Formed on Photoirradiated TiO2 Films in AirThe Journal of Physical Chemistry B, 1998
- Open air plasma chemical vapor deposition of highly dielectric amorphous TiO2 filmsApplied Physics Letters, 1996
- A novel and effective PECVD SiO/sub 2//SiN antireflection coating for Si solar cellsIEEE Transactions on Electron Devices, 1993
- The effect of substrate temperature on the properties of d.c. reactive magnetron sputtered titanium oxide filmsThin Solid Films, 1993
- A low-cost, high-efficiency solar cell based on dye-sensitized colloidal TiO2 filmsNature, 1991
- Pt-TiO2 thin films on glass substrates as efficient photocatalystsJournal of Materials Science, 1989