R.f.-sputtered silicon and hafnium nitrides: Properties and adhesion to 440C stainless steel
- 1 October 1983
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 108 (2) , 173-180
- https://doi.org/10.1016/0040-6090(83)90502-3
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- Some properties of r.f.-sputtered hafnium nitride coatingsThin Solid Films, 1982
- Sputtered silicon nitride coatings for wear protectionThin Solid Films, 1982
- Theoretical assessments of major physical processes involved in the depth resolution in sputter profilingRadiation Effects, 1982
- Silicon Nitride Single-Layer X-Ray MaskJapanese Journal of Applied Physics, 1981
- Plasma Si nitride—A promising dielectric to achieve high-quality silicon MIS/IL solar cellsJournal of Applied Physics, 1981
- Nitridation of silicon (111): Auger and LEED resultsJournal of Vacuum Science and Technology, 1980
- Machining evaluation of cemented carbide tools coated with HfN and TiC by the activated reactive evaporation processThin Solid Films, 1978
- High‐rate magnetron sputtering of high Tc Nb3Sn filmsJournal of Vacuum Science and Technology, 1977
- Properties and Behaviour of Precious-Metal Electrodeposits for Electrical ContactsTransactions of the IMF, 1962