On the mechanism of the sputtering of fine-grained targets by heavy multicharged ions
- 1 January 1983
- journal article
- research article
- Published by Taylor & Francis in Radiation Effects
- Vol. 79 (1) , 1-8
- https://doi.org/10.1080/00337578308207391
Abstract
The analytical expression for the sputtering yield of fine-grained targets by heavy multicharged ions derived previously by the authors is discussed. Experimental yields are given for the sputtering of fine-grained islet-like gold layers and for bulk gold foil by 45–65 MeV fission fragments. A comparison of the experimental yields with those obtained by calculation is made. Existing models of sputtering of targets by heavy multicharged ions are considered. Some assumptions on the sputtering mechanism are made.Keywords
This publication has 7 references indexed in Scilit:
- Analysis of clustering phenomena based on shock modelJournal of Nuclear Materials, 1977
- Dose distributions in phantoms outside 1-1000-GeV acceleratorsAtomic Energy, 1975
- Sputtering and chunk ejection from UO2 and metallic layers deposited on UO2Journal of Nuclear Materials, 1974
- Range and stopping-power tables for heavy ionsAtomic Data and Nuclear Data Tables, 1970
- Ion Explosion Spike Mechanism for Formation of Charged-Particle Tracks in SolidsJournal of Applied Physics, 1965
- Fission Fragment Damage in Semiconductors and Ionic CrystalsJournal of the Physics Society Japan, 1965
- Model for Fission-Fragment Damage in Thin Polycrystalline Metal FilmsJournal of Applied Physics, 1964