Laser-induced chemical vapour deposition of TiSi2: Aspects of deposition process, microstructure and resistivity
- 20 March 1991
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 198 (1-2) , 279-292
- https://doi.org/10.1016/0040-6090(91)90346-y
Abstract
No abstract availableKeywords
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