Mechanism of laser-induced ablation of polymeric solids
- 1 May 1991
- journal article
- research article
- Published by Taylor & Francis in Philosophical Magazine Letters
- Vol. 63 (5) , 289-294
- https://doi.org/10.1080/09500839108214657
Abstract
The mechanism of laser-induced polymer ablation is considered, which takes into account the temperature dependence of the quantum yield of photodissociation of macromolecules. On the basis of the suggested model, new formulae are derived for threshold fluence and for the fluence dependence of the etch depth. It is shown that these quantities depend on the thermo- and photophysical properties of the polymeric material.Keywords
This publication has 18 references indexed in Scilit:
- Theory for the etching of organic materials by ultraviolet laser pulsesApplied Physics Letters, 1989
- Theory of polymer ablationApplied Physics Letters, 1988
- Ultraviolet Laser Photoablation of Polymers: A Review and Recent ResultsLaser Chemistry, 1988
- Evidence for the Thermal Nature of Laser-Induced Polymer AblationPhysical Review Letters, 1987
- Excimer laser etching of polyimideJournal of Applied Physics, 1985
- Theory of photoablation and its implications for laser phototherapyThe Journal of Physical Chemistry, 1985
- Laser ablation of organic polymers: Microscopic models for photochemical and thermal processesJournal of Applied Physics, 1985
- Excimer laser ablation and thermal coupling efficiency to polymer filmsJournal of Applied Physics, 1985
- Photolysis and radiolysis of polyvinylacetate—III: Effect of temperature on the photolysisEuropean Polymer Journal, 1972
- Photodegradation of polymethylmethacrylate in solutionColloid and Polymer Science, 1965