Abstract
The N incorporation behavior in InP grown by gas‐source molecular beam epitaxy using a N radical beam source has been investigated. At a given growth temperature, the N composition in InNxP1−x is generally different from the N2 flow‐rate fraction in the vapor phase, and as the N2 flow‐rate fraction increases, it saturates after increasing to a certain point. This may be due to the small solubility of N in InP. Increasing the growth temperature will result in a loss of N incorporation into the InP as a result of the faster desorption of the N at high temperatures. Optical absorption measurements reveal that the band‐gap energy of InNxP1−x decreases drastically, resulting in band‐gap bowing.

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