Low energy electron diffraction study of the formation of TaO (111) on Ta (110)
- 31 January 1965
- journal article
- Published by Elsevier in Surface Science
- Vol. 3 (1) , 62-70
- https://doi.org/10.1016/0039-6028(65)90019-1
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Effects of Nitrogen, Methane, and Oxygen on Structure and Electrical Properties of Thin Tantalum FilmsJournal of Applied Physics, 1964
- The oxidation of tantalum at 50–300°CActa Metallurgica, 1958
- An X-Ray Investigation of the Tantalum-Oxygen System.Acta Chemica Scandinavica, 1954
- The Analysis of Photoelectric Sensitivity Curves for Clean Metals at Various TemperaturesPhysical Review B, 1931