Plasma-enhanced photoemission detection: a new method for real-time surface monitoring during plasma processing
- 1 May 1989
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Journal of Quantum Electronics
- Vol. 25 (5) , 1093-1103
- https://doi.org/10.1109/3.28005
Abstract
No abstract availableThis publication has 35 references indexed in Scilit:
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