Sputtered material
- 5 July 2005
- book chapter
- Published by Springer Nature
- p. 119-175
- https://doi.org/10.1007/3-540-12807-7_18
Abstract
No abstract availableKeywords
This publication has 79 references indexed in Scilit:
- Ion response to plasma excitation frequencyJournal of Applied Physics, 1981
- Reflection of hydrogen from stainless steel and NbJournal of Nuclear Materials, 1976
- Positive-ion bombardment of substrates in rf diode glow discharge sputteringJournal of Applied Physics, 1972
- Argon Content in (111) Silicon for Sputtering Energies below 200 eVJournal of the Electrochemical Society, 1970
- Full-Plane Threshold Energies for Cathode Sputtering of Metals with Ar+ IonsJournal of Applied Physics, 1963
- Ion Energies at the Cathode of a Glow DischargePhysical Review B, 1963
- Sputtering Experiments with 1- to 5-keV Ar+ IonsJournal of Applied Physics, 1963
- Investigation of the Sputtering of SiliconJournal of Applied Physics, 1961
- Atom Ejection Patterns in Single-Crystal SputteringJournal of Applied Physics, 1960
- Starting potentials of high-frequency gas discharges at low pressureProceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, 1948