Low temperature NH3 adsorption on clean amorphous silicon and on crystalline silicon surfaces and nitrogen bonding in hydrogenated amorphous silicon nitride films: A comparative X-ray photoelectron spectroscopy study
- 1 June 1987
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 149 (3) , 385-392
- https://doi.org/10.1016/0040-6090(87)90400-7
Abstract
No abstract availableKeywords
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