Electronic structure of hydrogenated and unhydrogenated amorphousSiNx (0x1.6): A photoemission study

Abstract
We present a comprehensive core-level and valence-band photoemission study of hydrogenated and unhydrogenated amorphous silicon nitride (aSiNx:H and aSiNx). Position, width, and shape of the Si 2p line as a function of x are interpreted in terms of a superposition of five chemically shifted components which correspond to the possible SiSi4nNn(n=0,,4) bonding configurations. The chemical shift per Si—N bond is between 0.62 (x0.6) and 0.78 eV (x1.3). From the intensities of the chemically shifted Si 2p components the number of Si—N bonds is calculated and compared with the total nitrogen concentration. Above x0.8 the average number of N—Si bonds per N starts to deviate from three. The addition of hydrogen increases this deviation because N—H bonds are favored over N—Si bonds. A band of N 2p lone-pair states is identified at the top of the valence bands in nearly stoichiometric a-Si3 N4. This band determines the position of the valenceband maximum (VBM) above x=1.1. Below x=1.1 Si—Si bonding states mark the VBM. The conduction-band minimum (CBM) is determined by Si-Si antibonding states up to x=1.25 and its position relative to the core levels is virtually unaffected by the presence of nitrogen or hydrogen. Above x=1.25, a transition to Si-N antibonding states occurs which is accompanied by a sharp recession of the CBM. The position of the Fermi energy within the gap is investigated as a function of x and the hydrogen content. Si—H and N—H bonding states are identified at 6.3 and 9.8 eV below the VBM in nearly stoichiometric a-Si3 N1: H. Si—Si bonding defect states lie 0.5 to 1.0 eV above the VBM and the corresponding antibonding states (3.0±0.3) eV above the VBM. Plasmon energies vary between 17 eV in a-Si and 22 eV in a-SiN1.5.