Adsorption isotherms of halogen compounds of acetic acid and alkaloids on a copper(100) plane during electrodeposition of copper from acid copper sulphate baths
- 31 May 1975
- journal article
- Published by Elsevier in Electrodeposition and Surface Treatment
- Vol. 3 (3) , 189-194
- https://doi.org/10.1016/0300-9416(75)90041-3
Abstract
No abstract availableKeywords
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