Stochastic model for thin film growth and erosion
- 12 April 1993
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 62 (15) , 1745-1747
- https://doi.org/10.1063/1.109593
Abstract
A linearized, stochastic theory of thin film growth and erosion is presented to describe the evolution of surface roughness in the case of good layer formation far from equilibrium, as is generally found in energetic growth techniques such as ion‐assisted vapor deposition. The variation of the power spectral density and root‐mean‐square roughness is studied for growth on smooth and rough substrates.Keywords
This publication has 10 references indexed in Scilit:
- Imaging performance of multilayer x-ray mirrorsApplied Physics Letters, 1992
- X-ray scattering from interfacial roughness in multilayer structuresJournal of Applied Physics, 1992
- Ion bombardment of thin layers: The effect on the interface roughness and its x-ray reflectivity (invited)Review of Scientific Instruments, 1992
- Fabrication of high-reflectance Mo–Si multilayer mirrors by planar-magnetron sputteringJournal of Vacuum Science & Technology A, 1991
- Enhancement of the reflectivity of multilayer x-ray mirrors by ion polishingOptical Engineering, 1990
- Fractal surface finishApplied Optics, 1988
- Soft X-ray reflectometry applied to the evaluation of surface roughness variation during the deposition of thin filmsRevue de Physique Appliquée, 1988
- Dynamic Scaling of Growing InterfacesPhysical Review Letters, 1986
- Optimization of multilayer soft X-ray mirrorsNuclear Instruments and Methods in Physics Research, 1984
- The surface statistics of a granular aggregateProceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, 1982