Dimensionally Induced Structural transformations in Titanium-Aluminum Multilayers
- 13 May 1996
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 76 (20) , 3778-3781
- https://doi.org/10.1103/physrevlett.76.3778
Abstract
Ti/Al multilayered thin films with a range of bilayer thicknesses have been fabricated by dc magnetron sputtering and characterized by transmission electron microscopy and high resolution electron microscopy. A series of structural transitions in the form of changes in the stacking sequence of the closed packed atomic planes in the Ti and Al layers have been observed as a function of the bilayer thickness. A possible explanation for these transitions based on the model initially proposed by Redfield and Zangwill is presented in this Letter.Keywords
This publication has 8 references indexed in Scilit:
- Microstructural transitions in Titanium-Aluminum thin film multilayersJournal of Electronic Materials, 1994
- fcc titanium in Ti-Al multilayersMaterials Letters, 1994
- Structural Transitions in Titanium-Aluminum Thin Film MultilayersMRS Proceedings, 1993
- Coherent fcc stacking in epitaxial Co/Cu superlatticesPhysical Review B, 1989
- Stacking structure and superconductivity in ruthenium-iridium bicrystal superlatticesPhysical Review B, 1986
- Stacking sequences in close-packed metallic superlatticesPhysical Review B, 1986
- The crystallography and deformation modes of hexagonal close-packed metalsInternational Materials Reviews, 1967
- Simplified LCAO Method for the Periodic Potential ProblemPhysical Review B, 1954