Dimensionally Induced Structural transformations in Titanium-Aluminum Multilayers

Abstract
Ti/Al multilayered thin films with a range of bilayer thicknesses have been fabricated by dc magnetron sputtering and characterized by transmission electron microscopy and high resolution electron microscopy. A series of structural transitions in the form of changes in the stacking sequence of the closed packed atomic planes in the Ti and Al layers have been observed as a function of the bilayer thickness. A possible explanation for these transitions based on the model initially proposed by Redfield and Zangwill is presented in this Letter.