Selectively released microstructures electroplated into thick positive photoresist
- 1 September 1993
- journal article
- Published by IOP Publishing in Journal of Micromechanics and Microengineering
- Vol. 3 (3) , 152-154
- https://doi.org/10.1088/0960-1317/3/3/015
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Fabrication of magnetic microstructures by using thick layer resistsMicroelectronic Engineering, 1993
- High depth to width aspect ratios in thick positive photoresist layers using near UV lithographyMicroelectronic Engineering, 1992
- Two-dimensional and three-dimensional interdigital capacitors as basic elements for chemical sensorsSensors and Actuators B: Chemical, 1991
- Multi electron beam lithography: Fabrication of a control unitMicroelectronic Engineering, 1989