Microfabrication of LiNbO3 by Reactive Ion-Beam Etching
- 1 August 1980
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 19 (8) , L463
- https://doi.org/10.1143/jjap.19.l463
Abstract
The ratio of the etching rate of LiNbO3 to AZ1350 at normal incidence for CHF3 ion is about 5 times as large as that for Ar ion. This high ratio is utilized to fabricate LiNbO3 blazed gratings and also LiNbO3 guided wave optical elements such as grating couplers to demonstrate that reactive ion-beam etching is a very useful microfabrication technique for LiNbO3.Keywords
This publication has 5 references indexed in Scilit:
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- Ridge waveguides and electro-optical switches in LiNbO3fabricated by ion-bombardment-enhanced etchingIEEE Transactions on Circuits and Systems, 1979
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- Microfabrication in LiNbO3 by ion-bombardment-enhanced etchingJournal of Vacuum Science and Technology, 1978
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