Deposition of optical thin films by ion beam sputtering
- 1 July 1984
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 117 (3) , 163-172
- https://doi.org/10.1016/0040-6090(84)90284-0
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
- Ion energy distribution in ion platingVacuum, 1983
- Thermalization of sputtered atomsJournal of Applied Physics, 1981
- Focused ion beam designs for sputter depositionJournal of Vacuum Science and Technology, 1979
- Energetic binary collisions in rare gas plasmasJournal of Vacuum Science and Technology, 1979
- Argon plasma bridge neutralizer operation with a 10-cm-beam-diameter ion etching sourceJournal of Vacuum Science and Technology, 1978
- Selective thermalization in sputtering to produce high TcfilmsIEEE Transactions on Magnetics, 1975
- Technology of Electron-Bombardment Ion ThrustersPublished by Elsevier ,1975
- Calculation of Ion Bombarding Energy and Its Distribution in rf SputteringPhysical Review B, 1968
- Ion Energies at the Cathode of a Glow DischargePhysical Review B, 1963