Microfabrication of metal-coated silicon tips and their field emission properties
- 1 March 1991
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 13 (1) , 505-508
- https://doi.org/10.1016/0167-9317(91)90142-z
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Formation of silicon tips with <1 nm radiusApplied Physics Letters, 1990
- Anisotropic reactive ion etching of titaniumJournal of Vacuum Science & Technology B, 1989
- Novel type of emissive flat panel display: the matrixed cold-cathode microtip fluorescent displayDisplays, 1987
- Physical properties of thin-film field emission cathodes with molybdenum conesJournal of Applied Physics, 1976