Large scale and low resistance ITO films formed at high deposition rates
- 15 April 1993
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 226 (1) , 104-109
- https://doi.org/10.1016/0040-6090(93)90213-9
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Low resistivity indium–tin oxide transparent conductive films. II. Effect of sputtering voltage on electrical property of filmsJournal of Vacuum Science & Technology A, 1990
- Properties of highly conducting ITO films prepared by ion platingApplied Surface Science, 1988
- Properties of tin doped indium oxide thin films prepared by magnetron sputteringJournal of Applied Physics, 1983
- Heat mirror coatings for energy conserving windowsSolar Energy Materials, 1981
- Electrical and optical properties of In2O3: Sn films prepared by activated reactive evaporationThin Solid Films, 1980