Study of a high contrast process for hydrogen silsesquioxane as a negative tone electron beam resist
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- 1 September 2003
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 21 (5) , 2018-2025
- https://doi.org/10.1116/1.1603284
Abstract
No abstract availableKeywords
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