Composition of natural oxide films on polycrystalline tantalum using XPS electron take‐off angle experiments
- 1 April 1992
- journal article
- research article
- Published by Wiley in Surface and Interface Analysis
- Vol. 18 (4) , 257-261
- https://doi.org/10.1002/sia.740180403
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Thickness of natural oxide films determined by AES and XPS with/without sputteringJournal of Vacuum Science & Technology A, 1985
- AES sputter profiling and angle resolved XPS of in situ grown very thin Tantalum‐oxide filmsSurface and Interface Analysis, 1984
- Auger electron spectroscopy investigations of the oxide-metal interface between anodic Ta2O5 layers and polycrystalline tantalumThin Solid Films, 1982
- Quantitative electron spectroscopy of surfaces: A standard data base for electron inelastic mean free paths in solidsSurface and Interface Analysis, 1979