a-Si : H produced by high-temperature thermal decomposition of silane
- 1 May 1979
- journal article
- letter
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 50 (5) , 3752-3754
- https://doi.org/10.1063/1.326284
Abstract
Hydrogenated amorphous silicon has been deposited by a new technique of thermal decomposition of silane from a hot tungsten or carbon foil heated to about 1600 °C. Initial measurements indicate that the resulting films have a fairly high photoresponse. Introduction of ammonia along with silane is seen to enhance the photoconductivity quite significantly.This publication has 4 references indexed in Scilit:
- Some properties of evaporated amorphous silicon made with atomic hydrogenJournal of Applied Physics, 1978
- Enhanced photoconductivity in nitrogen-doped amorphous silicon prepared by d.c. sputteringPhilosophical Magazine Part B, 1978
- Optical and photoconductive properties of discharge-produced amorphous siliconJournal of Applied Physics, 1977
- The Thermal Decomposition of SilaneJournal of the American Chemical Society, 1936