Characterization of microcrystalline silicon by Hall and photo-Hall measurements
- 1 December 1983
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 59-60, 799-802
- https://doi.org/10.1016/0022-3093(83)90291-0
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Low-temperature formation of polycrystalline silicon films by molecular beam depositionJournal of Applied Physics, 1982
- Hall mobility for electrons in undoped a-Si:HApplied Physics Letters, 1980
- Transport properties of polycrystalline silicon filmsJournal of Applied Physics, 1978