A pulsed halogen atom source for kinetic measurements in a Knudsen cell reactor

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Abstract
A simple solenoid‐valve pulsed halogen atom source for the measurement of heterogeneous reaction kinetics in a very low pressure reactor (VLPR) is described. The source leads to injection of 300 μs–300 ms pulses of halogen atoms into a Knudsen cell, where their number density can be monitored in real time by means of resonance enhanced multiphoton ionization (REMPI). The operation of the source does not interfere with the detection technique. The performance of the source has also been verified using effusive molecular beam mass spectrometric analysis of the effluents of the Knudsen cell. The source is expected to find application in a variety of studies related to fundamental questions regarding etching and deposition reactions, as well as in fundamental chemical kinetic studies involving atoms and stable free radicals.

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