Using CHARM-2 wafers to increase reliability in ion implant processing

This publication has 2 references indexed in Scilit:

• Charge neutralization in ion implanters
  Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1995
• Characterization of wafer charging mechanisms and oxide survival prediction methodology
  Published by Institute of Electrical and Electronics Engineers (IEEE) ,1994