Charge neutralization in ion implanters
- 1 March 1995
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 96 (1-2) , 22-29
- https://doi.org/10.1016/0168-583x(94)00447-1
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Progress in wafer charging and charge neutralizationNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1993
- Ion beam system design for ULSI device requirementsNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1991
- In situ monitoring of wafer charging during ion implantationNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1989