Use of a theoretical model to investigate RF and DC reactive sputtering of titanium and chromium oxide coatings
- 10 December 1998
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 110 (3) , 158-167
- https://doi.org/10.1016/s0257-8972(98)00689-6
Abstract
No abstract availableKeywords
This publication has 50 references indexed in Scilit:
- Reactive magnetron sputter deposition of polycrystalline vanadium nitride filmsJournal of Vacuum Science & Technology A, 1996
- Advances in partial-pressure control applied to reactive sputteringSurface and Coatings Technology, 1989
- Reactive sputtering characteristics of silicon in an ArN2 mixtureThin Solid Films, 1986
- Reactive sputter deposition: A quantitative analysisThin Solid Films, 1984
- Reactive deposition of low loss Al2O3 optical waveguides by modified dc planar magnetron sputteringJournal of Vacuum Science & Technology A, 1984
- Mechanisms of voltage controlled, reactive, planar magnetron sputtering of Al in Ar/N2 and Ar/O2 atmospheresJournal of Vacuum Science & Technology A, 1984
- Mechanisms of reactive sputtering of indium III: A general phenomenological model for reactive sputteringThin Solid Films, 1980
- The deposition rate of metallic thin films in the reactive sputtering processThin Solid Films, 1975
- Mechanism of rf reactive sputteringJournal of Applied Physics, 1975
- Reactive sputtering of metals in oxidizing atmospheresThin Solid Films, 1973