Molecular beam epitaxy growth of CuO and Cu2O films with controlling the oxygen content by the flux ratio of Cu/O+
- 2 October 1994
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 143 (3-4) , 221-226
- https://doi.org/10.1016/0022-0248(94)90059-0
Abstract
No abstract availableKeywords
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