Nitrogen ion implantation with energy scanning mode into Zr

Abstract
To study effects of ion implantation with the energy scanning mode on the surface structure and the depth profile, Zr samples were implanted with 15N2 ions, where ion energy was scanned in the range of 70–100 and 70–130 keV using a computer‐controlled power supply at an interval of 2 keV while monitoring the ion current of the sample. After the implantation of a total fluence of 3.5×1017 ions/cm2, the depth profiles of 15N2 ions in Zr were measured by nuclear reaction analysis of 15N(p,αγ)12C at 429 keV and the surface was observed by scanning electron microscopy. It was found that the implanted surface structure strongly depended on the implantation mode, and blistering induced by high fluence implantation of nitrogen could be completely avoided with the implantation mode of increasing energy gradually. The depth profiles were satisfactorily in agreement with the prediction by Monte Carlo simulation.

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